1.Etching Behavior of silicon nanowires with HF and NH4F and surface characterization by attenuated total reflection Fourier transform infrared spectroscopy: Similarities and differences between one-dimensional and two-dimensional silicon surfaces

Chen, WW, Sun, XH, W     More...

Chen, WW, Sun, XH, Wang, SD, Lee, ST, Teo, BK     Less

JOURNAL OF PHYSICAL CHEMISTRY B[1520-6106], Published 2005, Volume 109, Issue 21, Pages 10871-10879

收錄情况： WOS SCOPUS

WOS核心合集引用: 28  2022影響因子:  3.3  发表年影響因子:  4.033 

2.Molecular orientation and film morphology of pentacene on native silicon oxide surface

Wang, SD, Dong, X, L     More...

Wang, SD, Dong, X, Lee, CS, Lee, ST     Less

JOURNAL OF PHYSICAL CHEMISTRY B[1520-6106], Published 2005, Volume 109, Issue 20, Pages 9892-9896

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WOS核心合集引用: 35  2022影響因子:  3.3  发表年影響因子:  4.033 

3.Three-dimensional etching profiles and surface speciations (via attenuated total reflection-fourier transform infrared spectroscopy) of silicon nanowires in NH 4F-buffered HF solutions: A double passivation model

Teo, Boon K., Chen,     More...

Teo, Boon K., Chen, Weiwei, Sun, Xuhui, Wang, Suidong, Lee, Shuittong     Less

Journal of Physical Chemistry B[1520-6106], Published 2005, Volume 109, Issue 46, Pages 21716-21724

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WOS核心合集引用: 16  2022影響因子:  3.3  发表年影響因子:  4.033 

4.Orderly growth of copper phthalocyanine on highly oriented pyrolytic graphite (HOPG) at high substrate temperatures

Wang, SD, Dong, X, L     More...

Wang, SD, Dong, X, Lee, CS, Lee, ST     Less

JOURNAL OF PHYSICAL CHEMISTRY B[1520-6106], Published 2004, Volume 108, Issue 5, Pages 1529-1532

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WOS核心合集引用: 53  2022影響因子:  3.3  发表年影響因子:  3.834