1.A Petri net method for schedulability and scheduling problems in single-arm cluster tools with wafer residency time constraints

Wu, NQ, Chu, CB, Chu     More...

Wu, NQ, Chu, CB, Chu, F, Zhou, MC     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2008, Volume 21, Issue 2, Pages 224-237

收錄情况： WOS SCOPUS

WOS核心合集引用: 176  2023影響因子:  2.3  发表年影響因子:  0.957 

2.Analysis of Wafer Sojourn Time in Dual-Arm Cluster Tools With Residency Time Constraint and Activity Time Variation

Wu, NQ, Zhou, MC     More...

Wu, NQ, Zhou, MC     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2010, Volume 23, Issue 1, Pages 53-64

收錄情况： WOS SCOPUS

WOS核心合集引用: 71  2023影響因子:  2.3  发表年影響因子:  0.748 

3.Petri Net Modeling and Wafer Sojourn Time Analysis of Single-Arm Cluster Tools With Residency Time Constraints and Activity Time Variation

Qiao, Y, Wu, NQ, Zho     More...

Qiao, Y, Wu, NQ, Zhou, MC     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2012, Volume 25, Issue 3, Pages 432-446

收錄情况： WOS SCOPUS

WOS核心合集引用: 86  2023影響因子:  2.3  发表年影響因子:  0.862 

4.A Petri Net-Based Novel Scheduling Approach and Its Cycle Time Analysis for Dual-Arm Cluster Tools With Wafer Revisiting

Qiao, Y, Wu, NQ, Zho     More...

Qiao, Y, Wu, NQ, Zhou, MC     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2013, Volume 26, Issue 1, Pages 100-110

收錄情况： WOS SCOPUS

WOS核心合集引用: 65  2023影響因子:  2.3  发表年影響因子:  0.977 

5.Petri Net-Based Optimal One-Wafer Scheduling of Single-Arm Multi-Cluster Tools in Semiconductor Manufacturing

Zhu, QH, Wu, NQ, Qia     More...

Zhu, QH, Wu, NQ, Qiao, Y, Zhou, MC     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2013, Volume 26, Issue 4, Pages 578-591

收錄情况： WOS SCOPUS

WOS核心合集引用: 72  2023影響因子:  2.3  发表年影響因子:  0.977 

6.How to Respond to Process Module Failure in Residency Time-Constrained Single-Arm Cluster Tools

Qiao, Y, Wu, NQ, Pan     More...

Qiao, Y, Wu, NQ, Pan, CR, Zhou, MC     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2014, Volume 27, Issue 4, Pages 462-474

收錄情况： WOS SCOPUS

WOS核心合集引用: 36  2023影響因子:  2.3  发表年影響因子:  1.000 

7.Scheduling of Single-Arm Multi-cluster Tools With Wafer Residency Time Constraints in Semiconductor Manufacturing

Zhu, QH, Wu, NQ, Qia     More...

Zhu, QH, Wu, NQ, Qiao, Y, Zhou, MC     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2015, Volume 28, Issue 1, Pages 117-125

收錄情况： WOS SCOPUS

WOS核心合集引用: 55  2023影響因子:  2.3  发表年影響因子:  1.045 

8.Scheduling and Analysis of Start-Up Transient Processes for Dual-Arm Cluster Tools With Wafer Revisiting

Pan, CR, Qiao, Y, Zh     More...

Pan, CR, Qiao, Y, Zhou, MC, Wu, NQ     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2015, Volume 28, Issue 2, Pages 160-170

收錄情况： WOS SCOPUS

WOS核心合集引用: 28  2023影響因子:  2.3  发表年影響因子:  1.045 

9.Scheduling Transient Processes for Time-Constrained Single-Arm Robotic Multi-Cluster Tools

Zhu, QH, Zhou, MC, Q     More...

Zhu, QH, Zhou, MC, Qiao, Y, Wu, NQ     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2017, Volume 30, Issue 3, Pages 261-269

收錄情况： WOS SCOPUS

WOS核心合集引用: 15  2023影響因子:  2.3  发表年影響因子:  1.336 

10.Efficient Approach to Cyclic Scheduling of Single-Arm Cluster Tools With Chamber Cleaning Operations and Wafer Residency Time Constraint

Yang, FJ, Wu, NQ, Ga     More...

Yang, FJ, Wu, NQ, Gao, KZ, Zhang, CJ, Zhu, YT, Su, R, Qiao, Y     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2018, Volume 31, Issue 2, Pages 196-205

收錄情况： WOS SCOPUS

WOS核心合集引用: 17  2023影響因子:  2.3  发表年影響因子:  1.140 

11.Petri Net-Based Optimal One-Wafer Cyclic Scheduling of Hybrid Multi-Cluster Tools in Wafer Fabrication

Yang, FJ, Wu, NQ, Qi     More...

Yang, FJ, Wu, NQ, Qiao, Y, Zhou, MC     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2014, Volume 27, Issue 2, Pages 192-203

收錄情况： WOS SCOPUS

WOS核心合集引用: 35  2023影響因子:  2.3  发表年影響因子:  1.000 

12.Wafer Reflectance Prediction for Complex Etching Process Based on K-Means Clustering and Neural Network

Xiong, WQ, Qiao, Y,     More...

Xiong, WQ, Qiao, Y, Bai, LP, Ghahramani, M, Wu, NQ, Hsieh, PH, Liu, B     Less

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507], Published 2021, Volume 34, Issue 2, Pages 207-216

收錄情况： WOS SCOPUS

WOS核心合集引用: 8  2023影響因子:  2.3  发表年影響因子:  2.796