1.Wafer Reflectance Prediction for Complex Etching Process Based on K-Means Clustering and Neural Network
Xiong, WQ, Qiao, Y,
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Xiong, WQ, Qiao, Y, Bai, LP, Ghahramani, M, Wu, NQ, Hsieh, PH, Liu, B
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IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING[0894-6507],
Published 2021,
Volume 34,
Issue 2,
Pages 207-216
收錄情况：
WOS
SCOPUS
WOS核心合集引用: 8
2023影響因子:
2.3
发表年影響因子:
2.796
