1.AFM and Raman studies of topological insulator materials subject to argon plasma etching

Childres, I, Tian, J     More...

Childres, I, Tian, JF, Miotkowski, I, Chen, Y     Less

PHILOSOPHICAL MAGAZINE[1478-6435], Published 2013, Volume 93, Issue 6, Pages 681-689

收錄情况： WOS SCOPUS

WOS核心合集引用: 22  2023影響因子:  1.5  发表年影響因子:  1.427 

2.Ultrafast Surface Carrier Dynamics in the Topological Insulator Bi2Te3

Hajlaoui, M, Papalaz     More...

Hajlaoui, M, Papalazarou, E, Mauchain, J, Lantz, G, Moisan, N, Boschetto, D, Jiang, Z, Miotkowski, I, Chen, YP, Taleb-Ibrahimi, A, Perfetti, L, Marsi, M     Less

NANO LETTERS[1530-6984], Published 2012, Volume 12, Issue 7, Pages 3532-3536

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WOS核心合集引用: 207  2023影響因子:  9.6  发表年影響因子:  13.025 

3.Design Principle of Telluride-Based Nanowire Heterostructures for Potential Thermoelectric Applications

Zhang, GQ, Fang, HY,     More...

Zhang, GQ, Fang, HY, Yang, HR, Jauregui, LA, Chen, YP, Wu, Y     Less

NANO LETTERS[1530-6984], Published 2012, Volume 12, Issue 7, Pages 3627-3633

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WOS核心合集引用: 116  2023影響因子:  9.6  发表年影響因子:  13.025