1.Van der Waals Heterostructures for Photoelectric, Memory, and Neural Network Applications

Xu, H, Xue, Y, Liu,     More...

Xu, H, Xue, Y, Liu, ZQ, Tang, Q, Wang, TY, Gao, XC, Qi, YP, Chen, YP, Ma, CL, Jiang, YC     Less

SMALL SCIENCE[2688-4046], Published 2024,

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WOS核心合集引用: 10  2023影響因子:  11.2 

2.Applications of Raman spectroscopy in clinical medicine

Qi, YP, Chen, EX, Hu     More...

Qi, YP, Chen, EX, Hu, D, Yang, Y, Wu, ZP, Zheng, M, Sadi, MA, Jiang, YC, Zhang, K, Chen, Z, Chen, YP     Less

FOOD FRONTIERS[2643-8429], Published 2024, Volume 5, Issue 2, Pages 392-419

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WOS核心合集引用: 9  2023影響因子:  7.4 

3.Expanded graphite with boron-doping for cathode materials of high-capacity and stable aluminum ion batteries

Yang, Y, Zhao, RR, C     More...

Yang, Y, Zhao, RR, Chen, YP     Less

RSC ADVANCES[2046-2069], Published 2024, Volume 14, Issue 33, Pages 23902-23909

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WOS核心合集引用: 5  2023影響因子:  3.9 

4.Regulating crystallinity to balance the electrochemical performance of cobalt-tin oxide composite anodes for sodium-ion batteries

Yang, Y, Zhao, RR, L     More...

Yang, Y, Zhao, RR, Liu, CF, Qi, YP, Hu, D, Si, DH, Chen, YP     Less

NEW JOURNAL OF CHEMISTRY[1144-0546], Published 2024, Volume 48, Issue 38, Pages 16657-16668

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WOS核心合集引用: 0  2023影響因子:  2.7 

5.Deep learning assisted Raman spectroscopy for rapid identification of 2D materials

Qi, YP, Hu, D, Zheng     More...

Qi, YP, Hu, D, Zheng, M, Jiang, YC, Chen, YP     Less

APPLIED MATERIALS TODAY[2352-9407], Published 2024, Volume 41,

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WOS核心合集引用: 0  2023影響因子:  7.2 

6.Recent Progress in Strain Engineering on Van der Waals 2D Materials: Tunable Electrical, Electrochemical, Magnetic, and Optical Properties

Qi, YP, Sadi, MA, Hu     More...

Qi, YP, Sadi, MA, Hu, D, Zheng, M, Wu, ZP, Jiang, YC, Chen, YP     Less

ADVANCED MATERIALS[0935-9648], Published 2023, Volume 35, Issue 12,

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WOS核心合集引用: 128  2023影響因子:  27.4  发表年影響因子:  27.4 

7.Recent Progresses in Machine Learning Assisted Raman Spectroscopy

Qi, Yaping, Hu, Dan,     More...

Qi, Yaping, Hu, Dan, Jiang, Yucheng, Wu, Zhenping, Zheng, Ming, Chen, Esther Xinyi, Liang, Yong, Sadi, Mohammad A., Zhang, Kang, Chen, Yong P.     Less

Advanced Optical Materials[2195-1071], Published 2023, Volume 11, Issue 14,

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WOS核心合集引用: 92  2023影響因子:  8.0  发表年影響因子:  8.0 

8.Combined Raman Spectroscopy and Magneto-Transport Measurements in Disordered Graphene: Correlating Raman D Band and Weak Localization Features

Childres, I, Qi, YP,     More...

Childres, I, Qi, YP, Sadi, MA, Ribeiro, JF, Cao, HL, Chen, YP     Less

COATINGS[2079-6412], Published 2022, Volume 12, Issue 8,

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WOS核心合集引用: 4  2023影響因子:  2.9  发表年影響因子:  3.4 

9.Thermoelectric transport in coupled double layers with interlayer excitons and exciton condensation

Hu, JN, Rigosi, AF,     More...

Hu, JN, Rigosi, AF, Newell, DB, Chen, YP     Less

PHYSICAL REVIEW B[2469-9950], Published 2020, Volume 102, Issue 23,

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WOS核心合集引用: 1  2023影響因子:  3.2  发表年影響因子:  4.036 

10.Spin-momentum entanglement in a Bose-Einstein condensate

Kale, SS, Ding, YJ,     More...

Kale, SS, Ding, YJ, Chen, YP, Friedrich, B, Kais, S     Less

PHYSICAL CHEMISTRY CHEMICAL PHYSICS[1463-9076], Published 2020, Volume 22, Issue 44, Pages 25669-25674

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WOS核心合集引用: 3  2023影響因子:  2.9  发表年影響因子:  3.676 

11.Deep tuning of photo-thermoelectricity in topological surface states

Huang, SY, Miotkowsk     More...

Huang, SY, Miotkowski, I, Chen, YP, Xu, XF     Less

SCIENTIFIC REPORTS[2045-2322], Published 2020, Volume 10, Issue 1,

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WOS核心合集引用: 8  2023影響因子:  3.8  发表年影響因子:  4.380 

12.Enhancing the graphene photocurrent using surface plasmons and a p-n junction

Wang, D, Allcca, AEL     More...

Wang, D, Allcca, AEL, Chung, TF, Kildishev, AV, Chen, YP, Boltasseva, A, Shalaev, VM     Less

LIGHT-SCIENCE & APPLICATIONS[2047-7538], Published 2020, Volume 9, Issue 1,

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WOS核心合集引用: 66  发表年影響因子:  17.782 

13.Photoelectric Silk via Genetic Encoding and Bioassisted Plasmonics

Leem, JW, Allcca, AE     More...

Leem, JW, Allcca, AEL, Kim, YJ, Park, J, Kim, SW, Kim, SR, Ryu, WH, Chen, YP, Kim, YL     Less

ADVANCED BIOSYSTEMS[2366-7478], Published 2020, Volume 4, Issue 7,

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WOS核心合集引用: 6  发表年影響因子:  4.048 

14.Highly skewed current-phase relation in superconductor-topological insulator-superconductor Josephson junctions

Kayyalha, M, Kazakov     More...

Kayyalha, M, Kazakov, A, Miotkowski, I, Khlebnikov, S, Rokhinson, LP, Chen, YP     Less

NPJ QUANTUM MATERIALS[2397-4648], Published 2020, Volume 5, Issue 1,

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WOS核心合集引用: 26  2023影響因子:  5.4  发表年影響因子:  7.032 

15.Gate field effects on the topological insulator BiSbTeSe2 interface

Liu, SL, Xu, Y, Wang     More...

Liu, SL, Xu, Y, Wang, YP, Chen, YP, Fry, JN, Cheng, HP     Less

APPLIED PHYSICS LETTERS[0003-6951], Published 2020, Volume 116, Issue 3,

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WOS核心合集引用: 6  2023影響因子:  3.5  发表年影響因子:  3.791 

16.Interferometric control of photo-chemical reactions in 87Rb Bose-Einstein condensates

Esat Kondakci, H., B     More...

Esat Kondakci, H., Blasing, David B., Li, ChuanHsun, Chen, Yong P.     Less

Optics InfoBase Conference Papers, Published 2020, Volume Part F182-CLEO-QELS 2020,

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17.Plasmon-enhanced graphene photothermoelectric detector

Wang, Di, Kildishev,     More...

Wang, Di, Kildishev, Alexander V., Chen, Yong P., Boltasseva, Alexandra, Shalaev, Vladimir M., Llacsahuanga Allcca, Andres E., Chung, TingFung     Less

Optics InfoBase Conference Papers, Published 2020, Volume Part F183-CLEO-SI 2020,

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18.Increased Curie temperature and enhanced perpendicular magneto anisotropy of Cr2Ge2Te6/NiO heterostructures

Idzuchi, H, Allcca,     More...

Idzuchi, H, Allcca, AEL, Pan, XC, Tanigaki, K, Chen, YP     Less

APPLIED PHYSICS LETTERS[0003-6951], Published 2019, Volume 115, Issue 23,

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WOS核心合集引用: 56  2023影響因子:  3.5  发表年影響因子:  3.597 

19.Tuning Insulator-Semimetal Transitions in 3D Topological Insulator thin Films by Intersurface Hybridization and In-Plane Magnetic Fields

Xu, Y, Jiang, GD, Mi     More...

Xu, Y, Jiang, GD, Miotkowski, I, Biswas, RR, Chen, YP     Less

PHYSICAL REVIEW LETTERS[0031-9007], Published 2019, Volume 123, Issue 20,

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WOS核心合集引用: 21  2023影響因子:  8.1  发表年影響因子:  8.385 

20.Near-Field Imaging of Surface Plasmons from the Bulk and Surface State of Topological Insulator Bi2Te2Se

Venuthurumilli, PK,     More...

Venuthurumilli, PK, Wen, XL, Iyer, V, Chen, YP, Xu, XF     Less

ACS PHOTONICS[2330-4022], Published 2019, Volume 6, Issue 10, Pages 2492-2498

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WOS核心合集引用: 20  2023影響因子:  6.5  发表年影響因子:  6.864